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Risorsa bibliografica obbligatoria |
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Risorsa bibliografica facoltativa |
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Anno Accademico
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2017/2018
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Scuola
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Scuola di Ingegneria Industriale e dell'Informazione |
Insegnamento
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051442 - PLASMAS FOR SURFACE MICRO AND NANOSTRUCTURING + PHYSICS OF DISORDERED MATERIALS
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Docente |
Ossi Paolo Maria
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Cfu |
10.00
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Tipo insegnamento
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Monodisciplinare
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Corso di Studi |
Codice Piano di Studio preventivamente approvato |
Da (compreso) |
A (escluso) |
Insegnamento |
Ing Ind - Inf (Mag.)(ord. 270) - BV (478) NUCLEAR ENGINEERING - INGEGNERIA NUCLEARE | * | A | ZZZZ | 097716 - PHYSICS OF NUCLEAR MATERIALS + PHYSICS OF DISORDERED MATERIALS | 096038 - PLASMAS FOR SURFACE MICRO AND NANOSTRUCTURING | 097584 - PHYSICS OF DISORDERED MATERIALS | 051442 - PLASMAS FOR SURFACE MICRO AND NANOSTRUCTURING + PHYSICS OF DISORDERED MATERIALS | Ing Ind - Inf (Mag.)(ord. 270) - MI (474) TELECOMMUNICATION ENGINEERING - INGEGNERIA DELLE TELECOMUNICAZIONI | * | A | ZZZZ | 096038 - PLASMAS FOR SURFACE MICRO AND NANOSTRUCTURING | Ing Ind - Inf (Mag.)(ord. 270) - MI (486) ENGINEERING PHYSICS - INGEGNERIA FISICA | * | A | ZZZZ | 097584 - PHYSICS OF DISORDERED MATERIALS | 096038 - PLASMAS FOR SURFACE MICRO AND NANOSTRUCTURING | Ing Ind - Inf (Mag.)(ord. 270) - MI (491) MATERIALS ENGINEERING AND NANOTECHNOLOGY - INGEGNERIA DEI MATERIALI E DELLE NANOTECNOLOGIE | * | A | ZZZZ | 097584 - PHYSICS OF DISORDERED MATERIALS | 096038 - PLASMAS FOR SURFACE MICRO AND NANOSTRUCTURING |
Programma dettagliato e risultati di apprendimento attesi |
Plasmas for Surface Micro and Nanostructuring (a) +
Physics of Disordered Materials (b)
Topics (a)
1. Basics: plasma definition and parameters; Debye’s length; sheaths; ionis. degree; plasma oscillations; role of external magnetic (B) and electric (E) fields; dynamics of charged particles in non-uniform E and B fields; particle scattering; confinement, lateral, parallel; guiding center approx.; mirror effect
2. Plasma assisted physical vapour deposition (PAPVD) techniques
3. Plasma assisted chemical vapour deposition (PACVD) techniques
4. Physical mechanisms of sputtering; dc-sputtering, rf-sputtering, polarised sputtering, magnetron sputtering, unbalanced sputtering, closed field magnetron sputtering
5. Pulsed laser ablation – deposition: physics and technology
6. Deposition parameters vs microstructure evolution in thin films: comparison between plasma-assisted and non plasma-assisted techniques
7. Thermodynamic and kinetic models of film nucleation and growth
Topics (b)
- structural order; kinds of disorder; ordering rules; long range order parameters
- the glass transition; glass forming ability (GFA) criteria;
- physical mechanisms of structural modification upon energetic particle bombardment:
- electrons: RCS
- ions (elastic regime): linear versus dense collision cascade
- microscopic analysis of the space-time evolution of a collision cascade
- GFA in irradiated materials: interpretative and predictive criteria
- experimental techniques for the analysis of structural disorder: (a), elements of scattering theory; scattering from structurally disordered materials; (b), X-ray absorption spectroscopies: EXAFS; XANES; (c), vibrational spectroscopies: IR absorption and Raman scattering
- (a), short range order (CSRO; TSRO); (b), medium range order (MRO); (c), atomic clusters; fullerene; hollow diamonds
- nanocrystalline materials; structure and role of the interfaces; nanoglasses; synthesis of nanostructured materials via irradiation; nanostructured material response to irradiation
- quasicrystals: discovery, definition, aperiodic and quasi-periodic lattices; real quasicrystals; nano-quasicrystals; quasicrystal-amorphous and the reverse transition
- Transport in heavily disordered materials: the Anderson-Mott localization; historical introduction; conducting vs localized electrons; the metal-insulator transition; localization of light: from ballistic to diffusive transport to Anderson localization; localization and enhanced transport in quasicrystals
- modelling disordered structures: percolation, percolation probability and threshold; fractal geometry; diffusion limited aggregation; random interface growth; random close packing; anomalous transport properties of glasses at intermediate temperatures: excess specific heat, boson peak; gels versus glasses
Every year will be selected either section 6, or section 7; either section 8, or section 9.
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Note Sulla Modalità di valutazione |
The exam consists in an oral discussion on some of the topics listed in the Course program and displayed along the Lectures
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U.S. Inan, M. Golkowski, Principles of Plasma Physics for Engineers and Scientists, Editore: Cambridge University Press, Anno edizione: 2011, ISBN: 978-0-521-19372-6
M. Ohring, Materials Science of Thin Films , Editore: Academic Press, Anno edizione: 2002, ISBN: 0-12-524975-6
M. Pelliccione, T-Ming Liu, Evolution of thin film morphology , Editore: Springer, Anno edizione: 2008, ISBN: 978-0-387-75108-5
P.M. Ossi, Plasmi per Superfici , Editore: Polipress, Anno edizione: 2006, ISBN: 88-7398-026-0
K.E. Sickafus, E.A. Kotomin, B.P. Uberuaga (Eds.), Radiation Effects in Solids , Editore: Springer, Dordrecht, Anno edizione: 2007, ISBN: 1-4020-5294-4
P.M. Ossi, Disordered Materials - An Introduction , Editore: Springer, Anno edizione: 2006, ISBN: 3-540-29609-3
K. Binder, W. Kob, Glassy materials and disordered solids, Editore: World Scientific, Anno edizione: 2011, ISBN: 978-981-4350-17-4
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Nessun software richiesto |
Tipo Forma Didattica
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Ore didattiche |
lezione
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72.0
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esercitazione
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26.0
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laboratorio informatico
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0.0
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laboratorio sperimentale
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0.0
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progetto
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0.0
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laboratorio di progetto
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0.0
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Informazioni in lingua inglese a supporto dell'internazionalizzazione |
Insegnamento erogato in lingua

Inglese
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Disponibilità di materiale didattico/slides in lingua inglese
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Disponibilità di libri di testo/bibliografia in lingua inglese
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Possibilità di sostenere l'esame in lingua inglese
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