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Scheda Riassuntiva
Anno Accademico 2016/2017
Scuola Scuola di Ingegneria Industriale e dell'Informazione
Insegnamento 097737 - PLASMAS FOR SURFACE MICRO E NANOSTRUCTURING + PHYSICS OF DISORDERED MATERIALS
Docente Ossi Paolo Maria
Cfu 10.00 Tipo insegnamento Corso Integrato

Corso di Studi Codice Piano di Studio preventivamente approvato Da (compreso) A (escluso) Insegnamento
Ing Ind - Inf (Mag.)(ord. 270) - BV (478) NUCLEAR ENGINEERING - INGEGNERIA NUCLEARE*AZZZZ097716 - PHYSICS OF NUCLEAR MATERIALS + PHYSICS OF DISORDERED MATERIALS
097737 - PLASMAS FOR SURFACE MICRO E NANOSTRUCTURING + PHYSICS OF DISORDERED MATERIALS
096038 - PLASMAS FOR SURFACE MICRO AND NANOSTRUCTURING
097584 - PHYSICS OF DISORDERED MATERIALS
Ing Ind - Inf (Mag.)(ord. 270) - MI (474) TELECOMMUNICATION ENGINEERING - INGEGNERIA DELLE TELECOMUNICAZIONI*AZZZZ089479 - PLASMAS IN SURFACE ENGINEERING
Ing Ind - Inf (Mag.)(ord. 270) - MI (486) ENGINEERING PHYSICS - INGEGNERIA FISICA*AZZZZ097584 - PHYSICS OF DISORDERED MATERIALS
096038 - PLASMAS FOR SURFACE MICRO AND NANOSTRUCTURING
Ing Ind - Inf (Mag.)(ord. 270) - MI (491) MATERIALS ENGINEERING AND NANOTECHNOLOGY - INGEGNERIA DEI MATERIALI E DELLE NANOTECNOLOGIE*AZZZZ097584 - PHYSICS OF DISORDERED MATERIALS
096038 - PLASMAS FOR SURFACE MICRO AND NANOSTRUCTURING

Programma dettagliato e risultati di apprendimento attesi

 

Plasmas for Surface Micro and Nanostructuring (a) +

Physics of Disordered Materials (b)

 

 

 

 

Topics (a)

 

1. Basics: plasma definition and parameters; Debye’s length; sheaths; ionis. degree; plasma oscillations; role of external magnetic (B) and electric (E) fields; dynamics of charged particles in non-uniform E and B fields; particle scattering; confinement, lateral, parallel; guiding center approx.; mirror effect

2. Plasma assisted physical vapour deposition (PAPVD) techniques

3. Plasma assisted chemical vapour deposition (PACVD) techniques

4. Physical mechanisms of sputtering; dc-sputtering, rf-sputtering, polarised sputtering, magnetron sputtering, unbalanced sputtering, closed field magnetron sputtering

5. Pulsed laser ablation – deposition: physics and technology

6. Deposition parameters vs microstructure evolution in thin films: comparison between plasma-assisted and non plasma-assisted techniques

7. Thermodynamic and kinetic models of film nucleation and growth

 

Topics (b)

 

 

  1. structural order; kinds of disorder; ordering rules; long range order parameters
  2. the glass transition; glass forming ability (GFA) criteria;
  3. physical mechanisms of structural modification upon energetic particle bombardment:
      • electrons: RCS
      • ions (elastic regime): linear versus dense collision cascade    
      • microscopic analysis of the space-time evolution of a collision cascade
      • GFA in irradiated materials: interpretative and predictive criteria
  4. experimental techniques for the analysis of structural disorder: (a), elements of scattering theory; scattering from structurally disordered materials; (b), X-ray absorption spectroscopies: EXAFS; XANES; (c), vibrational spectroscopies: IR absorption and Raman scattering
  5. (a), short range order (CSRO; TSRO); (b), medium range order (MRO); (c), atomic clusters; fullerene; hollow diamonds
  6. nanocrystalline materials; structure and role of the interfaces; nanoglasses; synthesis of nanostructured materials via irradiation; nanostructured material response to irradiation
  7. quasicrystals: discovery, definition, aperiodic and quasi-periodic lattices; real quasicrystals; nano-quasicrystals; quasicrystal-amorphous and the reverse transition
  8. Transport in heavily disordered materials: the Anderson-Mott localization; historical introduction; conducting vs localized electrons; the metal-insulator transition; localization of light: from ballistic to diffusive transport to Anderson localization; localization and enhanced transport in quasicrystals
  9. modelling disordered structures: percolation, percolation probability and threshold; fractal geometry; diffusion limited aggregation; random interface growth; random close packing; anomalous transport properties of glasses at intermediate temperatures: excess specific heat, boson peak; gels versus glasses

 

 

Every year will be selected either section 6, or section 7; either section 8, or section 9.


Note Sulla Modalità di valutazione

The exam consists in an oral discussion on some of the topics listed in the Course program and displayed along the Lectures

 


Bibliografia
Risorsa bibliografica facoltativaU.S. Inan, M. Golkowski, Principles of Plasma Physics for Engineers and Scientists, Editore: Cambridge University Press, Anno edizione: 2011, ISBN: 978-0-521-19372-6
Risorsa bibliografica facoltativaM. Ohring, Materials Science of Thin Films , Editore: Academic Press, Anno edizione: 2002, ISBN: 0-12-524975-6
Risorsa bibliografica facoltativaM. Pelliccione, T-Ming Liu, Evolution of thin film morphology , Editore: Springer, Anno edizione: 2008, ISBN: 978-0-387-75108-5
Risorsa bibliografica facoltativaP.M. Ossi, Plasmi per Superfici , Editore: Polipress, Anno edizione: 2006, ISBN: 88-7398-026-0
Risorsa bibliografica facoltativaK.E. Sickafus, E.A. Kotomin, B.P. Uberuaga (Eds.), Radiation Effects in Solids , Editore: Springer, Dordrecht, Anno edizione: 2007, ISBN: 1-4020-5294-4
Risorsa bibliografica facoltativaP.M. Ossi, Disordered Materials - An Introduction , Editore: Springer, Anno edizione: 2006, ISBN: 3-540-29609-3
Risorsa bibliografica facoltativaK. Binder, W. Kob, Glassy materials and disordered solids, Editore: World Scientific, Anno edizione: 2011, ISBN: 978-981-4350-17-4

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schedaincarico v. 1.6.8 / 1.6.8
Area Servizi ICT
22/09/2021