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Microelectronic Technologies
The course illustrates the unit processes needed to realize an integrated circuit on silicon substrates. Beside acquiring familiarity with the unit processes physics and tools, the students will also learn how to arrange those basic steps into a process flow sequence. A simple CMOS circuit as well as a state of the art flash memory process flow will be analyzed.
Detailed program
-Semiconductor industry history
-Semiconductor physics review
-Process flow for a CMOS device
- Crystallography review (Bravais lattice, crystalline structures)
-Silicon lattice
- Defects and thermodynamics of point defects
-Mono-crystalline silicon growth (CZ)
-Silicon wafer fabrication process
- Silicon oxide structure
- Deal and Grove model
-Oxidation kinetic dependence on substrate orientation and doping
- Oxidation and point defects
- Charged defects in silicon oxide and CV measurements
- Advanced silicon oxidation techniques
- High-k dielectrics
- Dopant diffusion in silicon
- Fick’s law
- Analytical solutions to second Fick’s law (Gaussian and ERFC profiles)
- Correction to Fick’s law
- Diffusion and point defects
- Ion implanter structure
- Implanted concentration profiles, channeling effects
- Nuclear and electronic ion stopping
- Crystallographic damage and TED
-Projection lithography;
- Resolution and depth of focus
-Steppers e scanners;
-Masks and photo-resist
-Advanced applications (immersion lithography, EUV, e-beam) Deposizione di film sottili (CVD)
· Thin films deposition: CVD and PVD techniques
-Fluid dynamics basics
-APCVD and LPDCVD basic models
-Plasma-assisted CVD techniques
-Evaporation
-Sputtering
-Wet etching quick overview
-Plasma ecthing
Main properties
Plasma etchers
Etch chemistries
Basic models
- Local interconnects: silicides and salicides
- Contacts
*Ohmic vs rectifying behavior
*Main contact technologies
- Dielectrics: oxides and low-K materials
- Interconnects: subtractive and damascene approach
· NOR flash memory process flow
Text book
James D. Plummer, Michael D. Deal, Peter B. griffin, Silicon VLSI Technology. Fundamentals, Practice and Modeling, Prentice Hall, 2000, ISBN: 0130850373
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Inglese