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Scheda Riassuntiva
Anno Accademico 2014/2015
Scuola Scuola di Ingegneria Industriale e dell'Informazione
Insegnamento 096036 - PLASMAS FOR SURFACE MICRO AND NANOSTRUCTURING + FISICA DEI SISTEMI AMORFI E NANOCRISTALLINI [C.I.]
  • 096035 - PLASMAS FOR SURFACE MICRO AND NANOSTRUCTURING
Docente Ossi Paolo Maria
Cfu 5.00 Tipo insegnamento Modulo Di Corso Strutturato

Corso di Studi Codice Piano di Studio preventivamente approvato Da (compreso) A (escluso) Insegnamento
Ing Ind - Inf (Mag.)(ord. 270) - MI (402) INGEGNERIA FISICA* AZZZZ096038 - PLASMAS FOR SURFACE MICRO AND NANOSTRUCTURING
Ing Ind - Inf (Mag.)(ord. 270) - MI (424) INGEGNERIA NUCLEARE* AZZZZ096038 - PLASMAS FOR SURFACE MICRO AND NANOSTRUCTURING
096036 - PLASMAS FOR SURFACE MICRO AND NANOSTRUCTURING + FISICA DEI SISTEMI AMORFI E NANOCRISTALLINI [C.I.]
Ing Ind - Inf (Mag.)(ord. 270) - MI (426) MATERIALS ENGINEERING AND NANOTECHNOLOGY* AZZZZ096036 - PLASMAS FOR SURFACE MICRO AND NANOSTRUCTURING + FISICA DEI SISTEMI AMORFI E NANOCRISTALLINI [C.I.]
Ing Ind - Inf (Mag.)(ord. 270) - MI (474) TELECOMMUNICATION ENGINEERING - INGEGNERIA DELLE TELECOMUNICAZIONI* AZZZZ089479 - PLASMAS IN SURFACE ENGINEERING
Ing Ind - Inf (Mag.)(ord. 270) - MI (491) MATERIALS ENGINEERING AND NANOTECHNOLOGY - INGEGNERIA DEI MATERIALI E DELLE NANOTECNOLOGIE* AZZZZ096038 - PLASMAS FOR SURFACE MICRO AND NANOSTRUCTURING

Programma dettagliato e risultati di apprendimento attesi

PLASMAS FOR SURFACE MICRO AND NANOSTRUCTURING

 

 

Objectives and Contents

 

The Course aims at introducing the production, control and features of different types of cold plasmas obtained in different kinds of machines designed to deposit thin films and coatings. Plasma features are then put in correlation with the characteristics of the synthesized films. Specific attention is devoted to film structure and microstructure, as well as to mechanical, chemical and transport (mainly thermal and optical) properties. Cost-benefit considerations of relevance to the advanced manufacturing industry are developed comparing to each other different plasma-assisted deposition techniques.

 

 

Topics

 

1. Basics: plasma definition and parameters; Debye’s length; sheaths; role of external magnetic (B) and electric (E) fields; dynamics of charged particles in non-uniform E and B fields; particle scattering; confinement; mirror effect

2. Plasma assisted physical vapour deposition (PAPVD) techniques

3. Plasma assisted chemical vapour deposition (PACVD) techniques

4. Physical mechanisms of sputtering; dc-sputtering, rf-sputtering, polarised sputtering, magnetron sputtering, unbalanced sputtering, closed field magnetron sputtering

5. Pulsed laser ablation – deposition: physics and technology

6. Deposition parameters versus microstructure evolution in thin films: comparison between plasma-assisted and non plasma-assisted techniques

7. Thermodynamic and kinetic models of film nucleation and growth

 

 

Guided tours at Labs and didactic experiments are scheduled.

 

 

Scheduled number of lectures : 40 - 45

Scheduled number of exercise lectures : 11 - 6

 

 

Lecture notes in English provided to students attending the lectures and available on request to registered students

 

 

 

 

 

Textbooks

 

  • U.S. Inan, M. Golkowski : Principles of Plasma Physics for Engineers and Scientists – Cambridge (2011)

 

  • M.Ohring : Materials Science of Thin Films – Academic Press (2002)

 

  • M. Pelliccione, T-Ming Liu: Evolution of thin film morphology – Springer (2008)

 

  • P.M. Ossi, Plasmi per Superfici – Polipress (2006)

 

 

 

 


Note Sulla Modalità di valutazione

Exam

 

Oral discussion on the topics listed in the Course program and presented along the Lectures


Bibliografia
Risorsa bibliografica facoltativaU.S. Inan, M. Golkowski, Principles of Plasma Physics for Engineers and Scientists , Editore: Cambridge, Anno edizione: 2011
Risorsa bibliografica facoltativaM.Ohring, Materials Science of Thin Films , Editore: Academic Press, Anno edizione: 2002
Risorsa bibliografica facoltativaM. Pelliccione, T-Ming Liu, Evolution of thin film morphology , Editore: Springer (, Anno edizione: 2008
Risorsa bibliografica facoltativaP.M. Ossi, Plasmi per Superfici , Anno edizione: 2006

Software utilizzato
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Mix Forme Didattiche
Tipo Forma Didattica Ore didattiche
lezione
32.0
esercitazione
16.0
laboratorio informatico
0.0
laboratorio sperimentale
0.0
progetto
0.0
laboratorio di progetto
0.0

Informazioni in lingua inglese a supporto dell'internazionalizzazione
Insegnamento erogato in lingua Inglese
schedaincarico v. 1.6.8 / 1.6.8
Area Servizi ICT
22/09/2021